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Magnetron Sputtering Coating Production Line

Continuous magnetron sputtering coating Production Line Overview

Continuous magnetron sputtering coating is an advanced thin film deposition technology that uses a magnetic field to control the movement trajectory of ion beams in a low-pressure environment, achieving sputtering adhesion to the material surface, thereby forming a uniform, dense, and well-adhered thin film layer on the substrate. This technology can not only improve the hardness, wear resistance, and corrosion resistance of materials but also alter their optical,
electrical, and thermal properties to meet the needs of different fields.

Working principle

The working principle of continuous magnetron sputtering coating is to introduce a magnetic field on the surface of the target cathode and use the magnetic field to constrain the charged particles to increase the plasma density, thereby increasing the sputtering rate. Argon ions are accelerated by the cathode and bombard the surface of the cathode target, sputtering atoms from the target surface and depositing them on the substrate surface to form a thin film. By changing the targets of different materials and controlling different sputtering times, thin films of different materials and thicknesses can be obtained.

Technical advantages

High deposition rate: Due to the use of magnetron electrodes, a very large target bombardment ion current can be obtained, resulting in a high sputtering etching rate on the target surface and a high film deposition rate on the substrate surface.
● High power efficiency: The collision probability between low-energy electrons and gas atoms is high, resulting in a significant increase in gas ionization rate. Correspondingly, the impedance of the discharge gas (or plasma) is significantly reduced. Therefore, compared with DC diode sputtering, even if the working pressure is reduced from 1-10Pa to 10-2- 10-1Pa, the sputtering voltage is also reduced from several thousand volts to several hundred volts, and the sputtering efficiency and deposition rate increase by orders of magnitude.
Low energy sputtering: Due to the low cathode voltage applied to the target, the plasma is confined by the magnetic field in the space near the cathode, thereby suppressing the incidence of high-energy charged particles on one side of the substrate. Therefore, the degree of damage caused to substrates such as semiconductor devices by charged particle bombardment is lower than other sputtering methods.
Wide material applicability: All metals, alloys, and ceramic materials can be made into target materials; By direct current or radio frequency magnetron sputtering, pure metal or alloy coatings with precise and constant ratios, as well as metal reaction films with gas participation, can be generated to meet the requirements of diverse and high-precision thin films.

Application area

Continuous magnetron sputtering coating technology is widely used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memory, electronic control devices, etc; It can also be applied in the field of glass coating; it can also be applied to industries such as wear-resistant materials, high-temperature corrosion resistance, and high-end decorative products.

Product parameter

Continuous magnetron sputtering coating technology plays an important role in modern industry due to its high efficiency, uniformity, and controllability. With the advancement of technology, this technology will continue to drive the development of new materials and products, bringing more innovation and development opportunities to various industries.

Hongtian Technology Co., Ltd.

About Us

Hongtian Technology Co., Ltd. is China Magnetron Sputtering Coating Production Line Manufacturers and Magnetron Sputtering Coating Production Line Suppliers. And it was established in 2012, with a registered capital of 10 million yuan, is a national high-tech enterprise.
Headquartered in Shanghai, China, the company has a number of wholly-owned and holding subsidiaries in Nantong, Yancheng and other places in Jiangsu Province, and has established R & D centers in China and Japan to layout the global market. At present, the company has grown into a well-known domestic new energy intelligent equipment manufacturer, and is a enterprise in the field of lithium copper foil equipment in the country. The company's core technical team led by Mr. Matsuda Mitsuya in Nagoya, Japan, focuses on the development and integration of high-end manufacturing equipment and automation system in the field of high precision electromechanical equipment. Through the introduction of Japanese advanced technology and design concepts and the import of original precision parts from Japan, the various equipment products produced by the company have become industry benchmarks.

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Industry knowledge

1.What is Continuous Magnetron Sputtering Coating and How Does It Work?
Magnetron Sputtering Coating Production Line is an advanced and highly precise thin film deposition technique used to enhance material properties. It works by introducing a magnetic field on the surface of a target cathode, guiding the movement of ions in a low-pressure environment. This results in a sputtering process where atoms from the target are ejected by bombarding them with accelerated argon ions and subsequently deposited on a substrate. This thin film layer can be customized to meet the required thickness and material specifications by varying sputtering times and using different target materials.
At Hongtian Technology Co., Ltd., we understand the importance of advanced manufacturing technologies like continuous magnetron sputtering coating in modern industry. As a company specializing in cutting-edge electromechanical equipment and solutions, we are committed to offering high-quality products that leverage the latest technologies. Our advanced production capabilities include a fully equipped production workshop and warehouse, ensuring that our products meet the highest standards of quality and efficiency. Our new high-end electro-copper foil equipment park, located in Yancheng, Jiangsu Province, is part of our ongoing effort to enhance our technology offerings. This facility will enable us to further integrate advanced coating technologies, including magnetron sputtering, into the development of next-generation materials and smart equipment for the energy and electronics industries.
The working principle of magnetron sputtering involves controlling the plasma and ion density in a highly efficient manner. The ions accelerated from the cathode strike the target material, causing the target atoms to be ejected and then deposited on a substrate surface. The uniformity and density of the thin film layer formed are key attributes of this process, making it ideal for applications requiring consistent material properties, such as wear resistance, corrosion resistance, and enhanced optical or electrical characteristics. This versatility allows for coatings to be applied to a broad range of substrates, providing customization and precision in industries such as electronics, automotive, and energy.

2.What Are the Key Technical Advantages of Continuous Magnetron Sputtering?
The use of magnetron electrodes creates a large ion bombardment current, leading to an accelerated sputtering process and higher deposition rates. This is particularly beneficial in large-scale production environments where efficiency and speed are crucial.
Magnetron sputtering provides high power efficiency. The collision of low-energy electrons with gas atoms results in a higher gas ionization rate, which in turn reduces the impedance of the discharge plasma. This reduction in impedance means that the sputtering process operates at lower voltages and pressures, resulting in improved efficiency and reduced energy consumption. At Hongtian Technology Co., Ltd., we place great emphasis on power efficiency as it directly impacts both production costs and sustainability. Our continuous investment in state-of-the-art manufacturing facilities, such as our new high-end equipment park in Jiangsu, helps us to further optimize energy usage and improve the performance of the equipment we supply to our clients worldwide.
Another key advantage is low energy sputtering, which results in a more controlled deposition process. The magnetic field confines the plasma near the cathode, reducing the bombardment of high-energy particles on the substrate. This characteristic is especially important when working with sensitive materials like semiconductors, where high-energy particle exposure can cause damage. As a company committed to providing customized, high-performance solutions for industries ranging from electronics to automotive, Hongtian Technology Co., Ltd. integrates technologies like magnetron sputtering into our product offerings to ensure that we meet the highest quality standards while minimizing risks to delicate materials.
Wide material applicability is another reason for the widespread adoption of continuous magnetron sputtering. The process is versatile enough to accommodate various target materials, including metals, alloys, and ceramics. This flexibility allows for the production of thin films with specific properties, including metallic coatings, alloy films, and reaction films, which are crucial for industries requiring high-precision coatings, such as aerospace, automotive, and telecommunications.

3.What Are the Primary Applications of Continuous Magnetron Sputtering Coating?
The applications of continuous magnetron sputtering coating are vast and diverse, spanning across multiple industries. One of the most prominent fields is the electronics and information industry, where this technology is used extensively in the manufacturing of components like integrated circuits, semiconductors, and information storage devices. In these applications, the ability to produce thin films with tailored electrical and optical properties is critical. Magnetron sputtering allows for precise control over film thickness and material composition, making it ideal for creating coatings with specific conductivity, transparency, or reflective properties.
At Hongtian Technology Co., Ltd., we recognize the importance of continuous innovation in sectors such as electronics. Our own production capabilities, including the new high-end equipment park in Jiangsu, will enable us to continue driving innovation in areas like electronics manufacturing, where precision and material customization are paramount. We are dedicated to developing cutting-edge solutions that integrate the latest technologies, including magnetron sputtering, to provide our customers with high-quality products that meet the demands of modern applications.
Another significant application is glass coating, particularly for architectural and automotive glass. The thin films created through magnetron sputtering can improve the durability, functionality, and appearance of glass surfaces. This includes anti-reflective coatings, UV protection, and thermal insulation layers. These coatings not only enhance the aesthetic appeal but also contribute to energy efficiency by reducing heat absorption and improving the strength of the glass.
In addition to electronics and glass coatings, magnetron sputtering is also widely used in the field of wear-resistant materials. This technology enables the creation of hard, durable coatings that improve the wear resistance of components exposed to high friction, such as automotive parts, industrial machinery, and cutting tools. The high adhesion strength of the thin films produced through magnetron sputtering ensures that these coatings remain intact under demanding operational conditions, thereby extending the lifespan of the components.